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IBM Journal of Research and Development  
Volume 41, Number 1/2, Page 39 (1997)
Optical lithography
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High-numerical-aperture optical designs

by R. N. Singh, A. E. Rosenbluth, G. L.-T. Chiu, J. S. Wilczynski
This paper is an overview of the designs of high-numerical-aperture lenses for optical projection lithography at the IBM Thomas J. Watson Research Center.
Related Subjects: Lens design; Lithography; Optical lithography; Optical science and technology; Optics