IBM Journal of Research and Development
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Related Papers
1999Scaling the gate dielectric: Materials, integration, and reliability
1998Electrolessly deposited diffusion barriers for microelectronics
1995A half-micron CMOS logic generation
1995CMOS scaling into the 21st century: 0.1 μm and beyond
1994Adhesion between polymers
1975On Dislocations in GaAs1−xPx
1973Dislocations in Gadolinium Gallium Garnet (Gd3Ga5O12): III. Nature of Prismatic Loops and Helical Dislocations
1970Silicon Defect Structure Induced by Arsenic Diffusion and Subsequent Steam Oxidation
1966Dislocation-Induced Deviation of Phosphorus-Diffusion Profiles in Silicon
1962Direct Observation of Dislocation Loops in Arsenic-Doped Germanium
1959Diffusion Attenuation, Part II
1959Diffusion Attenuation, Part I
1957An Analysis of Diffusion in Semiconductors