IBM Journal of Research and Development
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Related Papers
2005Design and modeling of equipment used in electrochemical processes for microelectronics
2002Beyond the conventional transistor
2002Challenges and future directions for the scaling of dynamic random-access memory (DRAM)
2002Process requirements for continued scaling of CMOS—the need and prospects for atomic-level manipulation
2001Recent progress in electron-beam resists for advanced mask-making
1999Characterization of silicon surface preparation processes for advanced gate dielectrics
1999Fabrication of magnetic recording heads and dry etching of head materials
1999Plasma-etching processes for ULSI semiconductor circuits
1999Plasma processing damage in etching and deposition
1999Surface science issues in plasma etching
1998Applications of electrochemical microfabrication: An introduction
1998Electrochemical microfabrication by laser-enhanced photothermal processes
1998Microfabrication by electrochemical metal removal
1998Photoelectrochemical etching of semiconductors
1993Mass transfer of an impinging jet confined between parallel plates
1992Plasma-based dry etching techniques in the silicon integrated circuit technology