IBM Journal of Research and Development
IBM Skip to main content
  Home     Products & services     Support & downloads     My account  

  Select a country  
Journals Home  
  Systems Journal  
Journal of Research
and Development
    Current Issue  
    Recent Issues  
    Papers in Progress  
    Search/Index  
    Orders  
    Description  
    Patents  
    Recent publications  
    Author's Guide  
  Staff  
  Contact Us  
  Related links:  
     IBM Research  

IBM Journal of Research and Development  
Volume 21, Number 3, Page 219 (1977)
Analysis of Positive Photoresists
  Full article: arrowPDF   arrowCopyright info





   

Thermal Analysis of Positive Photoresist Films by Mass Spectrometry

by J. M. Shaw, M. A. Frisch, F. H. Dill
Mass spectrometry is used to monitor the effect of temperature on positive photoresist and its two major components, a base resin and a photoactive compound. This technique is also used to identify the photolytic products of photoresist by exposing it in situ to ultraviolet radiation and to identify the resulting volatile products when it is heated after exposure. Quantitative data are obtained for the two major thermal products of photoresist, and the activation energy is calculated for the thermal degradation of the photoactive compound.
Related Subjects: Circuit and device technology; Materials; Photoresists