IBM Journal of Research and Development
IBM Skip to main content
  Home     Products & services     Support & downloads     My account  

  Select a country  
Journals Home  
  Systems Journal  
Journal of Research
and Development
    Current Issue  
    Recent Issues  
    Papers in Progress  
    Recent publications  
    Author's Guide  
  Contact Us  
  Related links:  
     IBM Research  

IBM Journal of Research and Development  
Volume 20, Number 4, Page 376 (1976)
Nontopical Issue
  Full article: arrowPDF   arrowCopyright info


Scanning Electron Beam Lithography for Fabrication of Magnetic Bubble Circuits

by T. H. P. Chang, M. Hatzakis, A. D. Wilson, A. J. Speth, A. Kern, H. Luhn
A high-resolution technique is described for the experimental fabrication of Permalloy patterns for magnetic bubble circuits having linewidths as small as 3000 Å The system includes a computer-controlled electron beam, automatic registration, a modified field-stitching method, and exposure control to compensate for proximity effects. Patterns are formed either by electroplating or by evaporation. The system can be used either for directly writing on bubble wafers or for fabricating masks for x-ray or conformable-mask printing.
Related Subjects: Beams, charged particle; Lithography; Magnetic bubble technology; Storage (computer) devices and systems