IBM Journal of Research and Development
IBM Skip to main content
  Home     Products & services     Support & downloads     My account  

  Select a country  
Journals Home  
  Systems Journal  
Journal of Research
and Development
    Current Issue  
    Recent Issues  
    Papers in Progress  
    Recent publications  
    Author's Guide  
  Contact Us  
  Related links:  
     IBM Research  

IBM Journal of Research and Development  
Volume 28, Number 4, Page 461 (1984)
Nontopical Issue
  Full article: arrowPDF   arrowCopyright info


Modeling of defects in integrated circuit photolithographic patterns

by C. H. Stapper
In a previous paper by the same author the foundation was laid for the theory of photolithographic defects in integrated circuits. This paper expands on the earlier one and shows how to calculate the critical areas and probability of failure for dense arrays of wiring. The results are used to determine the nature of the defect size distribution with electronic defect monitors. Several statistical techniques for doing this are described and examples are given.
Related Subjects: Integrated circuits; Lithography; LSI; Models and modeling; Semiconductor technology